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![Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography: Journal of Applied Physics: Vol 97, No 5 Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography: Journal of Applied Physics: Vol 97, No 5](https://aip.scitation.org/action/showOpenGraphArticleImage?doi=10.1063/1.1856214&id=images/medium/1.1856214.figures.f5.gif)
Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography: Journal of Applied Physics: Vol 97, No 5
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Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography: Journal of Applied Physics: Vol 97, No 5
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Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography: Journal of Applied Physics: Vol 97, No 5
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